Scientists develop patch which could improve healing and reduce scarring

Scientists from Nanyang Technological University, Singapore (NTU Singapore) have developed a new gel patch prototype that could speed up the healing of a skin wound while minimising scarring. The team unveiled the patch in September as a proof-of-concept...DEVAMI

Source: http://www.spinalsurgerynews.com/2017/09/scientists-develop-patch-improve-healing-reduce-scarring/22369